For RPA calculations in VASP, a four step process can be utilized where the first step is to compute the occupied orbitals at either the GGA or hybrid GGA level.
I am curious with materials that are strongly correlated, such as NiO, if this ground state should be calculated using DFT+U or not. Are there any caveats with applying DFT+U that should be expected as well when following it up with RPA calculations?
